High Entropy Sputtering Target Product Specifications
Stainless Steel
High
Nil
Yes
Rigid
Metal
High Entropy Sputtering Target Trade Information
Cash in Advance (CID)
5000 Piece Per Month
10 Days
All India
Product Description
High Entropy Sputtering Target is made in two different compositions including AlMoTaVW and MgCoNiGuZn. It is an excellent metal doping material known for purity, stable quality, smaller grains, and density. Its coatings increase the hardness, reduce international stress, and enhance oxidation resistance temperature. Recent research trends in nano-materialization have shown excellent results in the mechanical processing of tools. We provide sputtering targets as per the needs of the customers. With our modern production facilities, we can meet the demands of high entropy targets seamlessly. With our customization capabilities, we can improvise the targets in terms of composition, structure, and other physical aspects.
FAQs of High Entropy Sputtering Target:
Q: What is the material of the High Entropy Sputtering Target?
A: The material of the High Entropy Sputtering Target is stainless steel.
Q: Does the High Entropy Sputtering Target have high purity?
A: Yes, the High Entropy Sputtering Target has high purity.
Q: Is the High Entropy Sputtering Target an alloy?
A: Yes, the High Entropy Sputtering Target is an alloy.
Q: What is the hardness of the High Entropy Sputtering Target?
A: The High Entropy Sputtering Target has rigid hardness.
Q: Does the High Entropy Sputtering Target have any moisture content?
A: No, the High Entropy Sputtering Target has nil moisture.